Simple and Versatile Analytical Method for Monitoring the Deposition of Thin Layers by Optical Measurement and Calculation of Residual Stress

This paper develops a simple and versatile analytical method for characterizing residual stress associated with the deposition of thick, thin, single multilayer coatings. study is great importance, since generation can lead to formation significant defects in coating. To illustrate effectiveness our method, two different processes were characterized. The coatings formed are intended anti-corrosion applications. first Physical Vapour Deposition (PVD) involving High Power Impulsed Magnetron Sputtering (HiPIMS), second sol-gel process. approach based on optical recording curvature thin substrate, followed by its assessment using fit digitalized image parametric model. results provide experimental data development during deposition. Both studied have low level stress, which explains why they flawless interesting targeted application. For PVD coating, it was possible link evolution film structure growth. process, allowed us highlight drying reaction mechanisms involved transition their influence gel structure.